2024 Model-based opc using the meef matrix

Model-based opc using the meef matrix

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Web暨南大学,数字图书馆. 开馆时间：周一至周日7:00-22:30 周五 7:00-12:00; 我的图书馆 Web1.A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic apparatus comprising an illumination …

Model-based OPC using the MEEF matrix II

WebModel-based OPC using the MEEF matrix. NB Cobb, Y Granik. 22nd Annual BACUS Symposium on Photomask Technology 4889, 1281-1292, 2002. 107: 2002: Correction … WebThis page is a summary of: Model-based OPC using the MEEF matrix II, March 2014, SPIE, DOI: 10.1117/12.2046635. You can read the full text: Read. Contributors. Be the … enh sham mage tower guide

FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES

WebModel-based OPC using the MEEF matrix. This paper covers the topic of matrix-OPC. In matrix-OPC, we perform OPC edge movements, considering the cross-MEEF of all … Web_ _ Cobb, N., and Y. Granik, “Model-Based OPC Using the MEEF Related U-s- Appllcatlon Data Matrix,” Proceedings of SPIE, vol. 4889: 22nd Annual BACUS ?led on Jan. 31, 2003, noW Pat. No ... L_ APPLY MODEL-BASED OPC @ U.S. Patent Nov. 6, 2007 Sheet 8 0f 28 US 7,293,249 B2 620 610 630 MAX #OFEDGES 0 MIN CONTRAST FIG. 6 710 … WebSPIE Digital Library Proceedings dreyser multiservicios

OPC convergence improvement by matrix OPC solver on high …

Model-based OPC using the MEEF matrix - DeepDyve

WebTo address this issue, a new kind of MB-OPC algorithm based on MEEF matrix was introduced which is also called matrix OPC. In this paper, a variant of such matrix OPC algorithm is proposed which is suitable for kernel-based lithography models. Comparing with that based on MEEF matrix, this algorithm requires less computation in matrix … Web31 jul. 2002 · Model-based OPC using the MEEF matrix. Conference Paper. Dec 2002; Proceedings of SPIE; ... A method of assist feature OPC layout is introduced using a frequency model-based approach. enh shaman wotlk pvpWeb15 mei 2011 · The quality of model-based OPC (MB-OPC) is directly determined by segment offsets after OPC processing. However, in conventional MB-OPC, the intensity … dreyson meaning

"Web24 dec. 2024 · Several algorithms have been proposed to minimize edge placement error (around wafer image contours) in model-based OPC. Mask error enhancement factor … " - Model-based opc using the meef matrix

Model-based opc using the meef matrix

Matrix-OPC with fast MEEF prediction using artificial neural network

Web24 dec. 2002 · Matrix OPC has application to the following areas: (1) OPC on PSM where non-adjacent edges can have larger impact than adjacent edges, (2) dipole and … Web_ _ Cobb, N., and Y. Granik, “Model-Based OPC Using the MEEF Related U-s- Appllcatlon Data Matrix,” Proceedings of SPIE, vol. 4889: 22nd Annual BACUS ?led on Jan. 31, …

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Web28 aug. 2003 · Abstract We use the gradient of the image slope and gradient of the edge placement error (EPE) in order to improve both slope and EPE during OPC. The EPE gradient taken with respect to edge position is normally called MEEF or the MEEF matrix. Web28 feb. 2014 · Several algorithms have been proposed to minimize edge placement error (around wafer image contours) in model-based OPC. Mask error enhancement factor …

Web9052 0N Model-based OPC using the MEEF matrix II [9052-22] J. Lei, L. Hong, G. Lippincott, J. Word, Mentor Graphics Corp. (United States) iv. MULTIPLE PATTERNING AND SMO 9052 0O Immersion lithography extension to sub-10nm nodes with multiple patterning [9052-23] WebModel-based OPC using the MEEF matrix II Proc. SPIE 9052, Optical ... The advancement in technology node requires continues updates to OPC modeling test …

WebWhat is claimed is: 1. A method, executed by at least one processor of a computer, comprising: receiving a layout design; performing a machine learning-based clustering … Web27 mrt. 2007 · Model-based OPC using the MEEF matrix Nicolas B. Cobb, Y. Granik Computer Science Photomask Technology 2002 This paper covers the topic of matrix …

Web22 feb. 2024 · Model-based OPC using the MEEF matrix II. Article. Feb 2014; Proceedings of SPIE; ... This is an exquisite approach with regard to the contour-based OPC, for the model is calibrated directly from ...

Web24 dec. 2002 · Model-based OPC using the MEEF matrix DOI: Authors: Nicolas B. Cobb Yuri Granik Siemens Request full-text Abstract This paper covers the topic of matrix … dreyson hicksWeb1 Detection of OPC Conflict Edges through MEEF Analysis . Li-Fu Chang1, Chang-IL Choi1, Guojie Cheng2, Abhishek Vikram 2, Gary Zhang2 . and Bo Su3 . 1Semiconductor … dreyson arroyo teixeiraWeb31 mrt. 2014 · Model-based OPC using the MEEF matrix II, Proceedings of SPIE 10.1117/12.2046635 DeepDyve Model-based OPC using the MEEF matrix II Lei, Junjiang; Hong, Le; Lippincott, George; Word, James Proceedings of SPIE, Volume 9052 – Mar 31, 2014 Read Article Download PDF Share Full Text for Free (beta) 9 pages Article … dreys meaningWeb1 mrt. 2007 · In this paper, a variant of such matrix OPC algorithm is proposed which is suitable for kernel-based lithography models. Comparing with that based on MEEF matrix, this algorithm requires less ... dreyson thiago amorimWebModel-based SRAF insertion United States Patent 8037429 Abstract: A system for producing mask layout data retrieves target layout data defining a pattern of features, or portion thereof and an optimized mask layout pattern that includes a number of printing and non-printing features. enh shaman wotlk stat priorityWebModel-based OPC using the MEEF matrix II. Author (s): Junjiang Lei Le Hong George Lippincott James Word. Format. Member Price. Non-Member Price. PDF. $17.00. $21.00. Add to cart. enh sham sim wotlkWebA dynamic feedback controller for Optical Proximity Correction (OPC) in a random logic layout using ArF immersion Lithography is presented. The OPC convergence, … drey spencer influencer baby